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Derniers dépôts
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Simon Chouteau, L. Stafford, Agnès Granier, Antoine Goullet, Mireille Richard-Plouet. Handling Nanoparticle Content in Nanocomposite Thin Films Deposited by Misty Plasma Processes through Controlled Flash Boiling Atomization. Langmuir, 2024, 40 (6), pp.3015-3023. ⟨10.1021/acs.langmuir.3c03176⟩. ⟨hal-04549282⟩
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Issraa Shahine, Quentin Hatte, Maxime Harnois, Pierre-Yves Tessier. Large Area Freestanding Au Nanoporous Ultrathin Films Transfer Printed on Bendable Substrates and 3D Surfaces for Flexible Electronics. ACS Applied Electronic Materials, 2024, 6 (4), pp.2281-2288. ⟨10.1021/acsaelm.3c01771⟩. ⟨hal-04552765⟩
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Pascal Bargiela, Vincent Fernandez, Christophe Cardinaud, John Walton, Mark Greiner, et al.. Towards a reliable assessment of charging effects during surface analysis: Accurate spectral shapes of ZrO2 and Pd/ZrO2 via X-ray Photoelectron Spectroscopy. Applied Surface Science, 2021, 566, pp.150728. ⟨10.1016/j.apsusc.2021.150728⟩. ⟨hal-03355769⟩
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Allan Lebreton, Marie-Paule Besland, Pierre-Yves Jouan, Tatiana Signe, Cédric Mannequin, et al.. Control of microstructure and composition of reactively sputtered vanadium nitride thin films based on hysteresis curves and application to microsupercapacitors. Journal of Vacuum Science & Technology A, 2024, 42 (2), pp.023405. ⟨10.1116/5.0177028⟩. ⟨hal-04423908⟩
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Michael Rodriguez-Fano, Mohamad Haydoura, Julien Tranchant, Etienne Janod, Benoît Corraze, et al.. Enhancing the Resistive Memory Window through Band Gap Tuning in Solid Solution (Cr1–xVx)2O3. ACS Applied Materials & Interfaces, 2023, 15 (47), pp.54611-54621. ⟨10.1021/acsami.3c09387⟩. ⟨hal-04361024⟩
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J. Zgheib, L. Berthelot, J. Tranchant, N. Ginot, M.-P. Besland, et al.. Electron-enhanced high power impulse magnetron sputtering with a multilevel high power supply: Application to Ar/Cr plasma discharge. Journal of Vacuum Science & Technology A, 2023, 41 (6), pp.063003. ⟨10.1116/6.0002857⟩. ⟨hal-04299303⟩
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T Meyer, A Girard, M Bouška, E Baudet, M Baillieul, et al.. Mass spectrometry and in situ x-ray photoelectron spectroscopy investigations of organometallic species induced by the etching of germanium, antimony and selenium in a methane-based plasma. Plasma Sources Science and Technology, 2023, 32 (8), pp.085003. ⟨10.1088/1361-6595/aceaa5⟩. ⟨hal-04186877⟩
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Anthony Valero, Adrien Mery, Dorian Gaboriau, Marc Dietrich, Maggie Fox, et al.. Redefining high-k dielectric materials vision at nanoscale for energy storage: A new electrochemically active protection barrier. Electrochimica Acta, 2021, 389, pp.138727. ⟨10.1016/j.electacta.2021.138727⟩. ⟨hal-03355843⟩
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Rémi Dussart, Thomas Tillocher, Gaelle Antoun, Jack Nos, Philippe Lefaucheux, et al.. Plasma cryogenic etching processes: what are the mechanisms involved at very low temperature ?. 14th EU-Japan Joint Symposium on Plasma Processing (JSPP) 2023, Satoshi Hamaguchi, Apr 2023, Okinawa, Japan, Japan. ⟨hal-04072312⟩
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Nombre de documents
77
Nombre de notices
277
Mots-clés
V2O3
Biocapteurs
CIGSe
AZO thin films
B2 Semiconducting alloys
Physical vapor deposition
Chalcogenides
Alzheimer's disease
B1 Inorganic compounds
AlN
TiO2
Thin films
XPS
Titanium dioxide
Chalcogenide
Bipolar resistive switching BRS
Ablation laser
Transmission electron microscopy
Chalcogenide glass
CNTs’ collapse
Adsorption
B3 Solar cells
SF 6
Ambipolar material
NEXAFS
TEM
Alloying
Argon InP chlorine etching inductive coupled plasma ICP modeling plasma sheath simulation
Amorphous
Atomic layer etching
Nanotubes
Chemical and biological sensors
Aryl-diazonium salts
CH4
Films
Spectroscopic ellipsometry
Low-pressure plasma processing
Magnetron sputtering
Transfert d'énergie
C Photoelectron spectroscopy
BOMBARDMENT
Applications industrielles
Band alignment
X-ray photoelectron spectroscopy
Amyloid precursor
Functionalization
3 nm in size
B2 Semiconducting indium compounds
AuCu alloy
Cathepsin
Avalanche breakdown
Biomasse
Carbon nanotubes
A-CNx
Carbon
Atomic force microscopy
Structure
Aluminium nitride
Copper
Mott insulator
Sputtering
A3 Physical vapor deposition processes
Bixbyite
Optical properties
Carbon nitride
Nanocomposite
Resistive switching
B Chemical synthesis
Plasmas froids
A Multilayers
X-ray diffraction
PECVD
Etching
Colloidal solution
Buffer Couple
A Chalcogenides
Chemical detection
Scanning electron microscopy
Thin film
Calcined clay
A Thin films
Anatase
Band gap
A1 Characterization
Mott insulators
Selenization
Semiconductors
Non-volatile memory
Vanadium Sesquioxide
Oxides
CHLORINE PLASMAS
Carbon Nanotube
Plasma etching
Sol-gel
CaTiO3Pr^3^+
B2 Quaternary
Residual stress
Biofilms microbiens
Capacitance
Kirkendall effect